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Загальна кількість знайдених документів : 3
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Efremov A. A. Nanoprobe spectroscopy of capillary forces and its application for a real surface diagnostics [Електронний ресурс] / A. A. Efremov, P. M. Lytvyn, А. O. Anishchenko, O. M. Dyachyns'ka, T. A. Aleksyeyeva, I. V. Prokopenko // Semiconductor physics, quantum electronics & optoelectronics. - 2010. - Vol. 13, № 2. - С. 111-124. - Режим доступу: http://nbuv.gov.ua/UJRN/MSMW_2010_13_2_3 The paper presents an overview and analysis of the most reliable and at the same time rather simple theoretical models describing liquid nanomeniscus geometry and forces occurring between atomic force microscope (AFM) probe and a real surface. There are experimental results in capillary bridge force rupture measured in air, and interaction force under water buffer obtained over surfaces of different nature. It is shown that the theoretical models quite adequately describe the processes observed experimentally and, in particular, bridge ruptures dynamics at the vertical probe withdraw for different speeds. Discussed here are some methodological peculiarities and nanocapillary force spectroscopy diagnostic capabilities for surface energy mapping, prospects of using of a liquid nanomeniscus in local nanochemistry, nanolithography and nano-electrochemistry of a surface.
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Efremov A. A. Dopant depth profile modification during mass Spectrometric analysis of multilayer nanostructures [Електронний ресурс] / A. A. Efremov, V. G. Litovchenko, V. P. Melnik, O. S. Oberemok, V. G. Popov, B. M. Romanyuk // Ukrainian journal of physics. - 2015. - Vol. 60, № 6. - С. 511-520. - Режим доступу: http://nbuv.gov.ua/UJRN/Ukjourph_2015_60_6_6
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Lytvyn P. M. Features of mechanical scanning probe lithography on graphene oxide and As(Ge)Se chalcogenide resist [Електронний ресурс] / P. M. Lytvyn, S. V. Malyuta, I. Z. Indutnyi, A. A. Efremov, O. V. Slobodyan, V. I. Min’ko, A. N. Nazarov, O. V. Borysov, I. V. Prokopenko // Semiconductor physics, quantum electronics & optoelectronics. - 2018. - Vol. 21, № 2. - С. 152-159. - Режим доступу: http://nbuv.gov.ua/UJRN/MSMW_2018_21_2_9 Combined mechanical scanning probe lithography (SPL) approach applied for the direct mask-less modification of graphene oxide (GO) flakes and the mask patterns engraving in layers of chalcogenide resist with a nanometer scale resolution have been implemented in this work. It was compared the dynamics of mechanical modification of chalcogenide films and multilayer GO flakes deposited from an aqueous suspension. The double-layer As40Se60/As4Ge30S66 chalcogenide resist developed for mechanical SPL and pattern formation processes have optimized. The resist with the thickness close to 100 nm provides formation of minimal pattern elements with the size of several tens nanometers. The SPL approach was realized on the basis of serial NanoScope IIIa Dimension 3000 scanning probe microscope, and original software utilities were developed. These mechanical SPL could be intended for the verification of innovative ideas in academic researches, the laboratory-level device prototyping, developing the functional prototypes of new devices in bio/nanosensorics, plasmonics, 2D electronics and other modern technology branches.
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