The deposition of a niobium film at room temperature is studied. The dynamics of changing in the surface relief of a growing film is investigated by the method of molecular dynamics. It has been found that, in the process of film growth on the flat surface, "microcracks" which lie along crystallographic directions <$E symbol ... 100 symbol ъ> are formed. The internal microstresses occurring in the film are calculated. It is shown that the entire complex of phenomena (the porosity appearance, block structure formation, occurrence of internal microstresses under low-temperature atomic deposition) takes place as a consequence of the growing film shape instability development in the course of the atomic flow deposition.

• Марченко Іван Григорович (1957–) (фізико-математичні науки)
• Неклюдов Іван Матвійович (1935–) (фізико-математичні науки)

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